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Viser: Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Oluwatobi Adeleke, Sina Karimzadeh og Tien-Chien Jen
(2025)
Sprog: Engelsk
om ca. 15 hverdage
Detaljer om varen
- Paperback: 354 sider
- Udgiver: CRC Press LLC (Maj 2025)
- Forfattere: Oluwatobi Adeleke, Sina Karimzadeh og Tien-Chien Jen
- ISBN: 9781032386737
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.